Structural, Optical and Raman Characterization of Nano-Crystalline Cu Doped ZnO Thin Films Deposited by Pulse Laser Deposition Technique

Authors

  • Pawan Kumar

  • Aravind Kumar

  • Alvaro Instan

  • Ram S. Katiyar

Keywords:

ZnO, PLD, XRD, AFM, and raman characterization

Abstract

In the present work Cu doped ZnO thin films were deposited on Indium Tin Oxide ITO substrates using Pulse Laser Deposition PLD at different substrate temperatures The effect of substrate temperature on the structure of thin films surface morphology optical and electrical properties of the deposited thin films was investigated The structure of Cu doped ZnO confirmed by using a X-ray diffraction pattern X-ray diffraction patterns show that all thin films have a wurtzite structure with 002 orientation Atomic force microscopy are used for surface analyses The transmittance of the thin films was measured in the wavelength range of 300 nm - 800 nm The band gap of the thin films was estimated 3 14 eV to 3 28 eV using the UV-Visible absorption spectra Raman spectroscopy was used to find the atomic bond behavior at room temperature and lower than room temperature These films have a possible application in thin films based on solar cells and sensors

How to Cite

Pawan Kumar, Aravind Kumar, Alvaro Instan, & Ram S. Katiyar. (2019). Structural, Optical and Raman Characterization of Nano-Crystalline Cu Doped ZnO Thin Films Deposited by Pulse Laser Deposition Technique. Global Journal of Science Frontier Research, 19(A9), 43–49. Retrieved from https://journalofscience.org/index.php/GJSFR/article/view/2535

Structural, Optical and Raman Characterization of Nano-Crystalline Cu Doped ZnO Thin Films Deposited by Pulse Laser Deposition Technique

Published

2019-05-15