Features of the Homogeneous Plasmonic Structures on Porous Silicon Formation

Abstract

In this work we demonstrate the feasibility of fabricating uniform periodic plasmonic structure of Ni-PNP por-Si by masking the wafer surface using optical lithography followed by pore formation and deposition of plasmonic Ni-nanoparticles Ni-PNP in a single-step metalassisted electrochemical etching process It is shown that the high energetics of nc-PS and of the nc-PS c-Si interface facilitates the formation of uniform plasmonic Ni-PNP PS structures using a single-step pore etching and deposition of plasmonic nanoparticles